Make and Test a Semiconductor Device

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A Schottky Diode








- Useful Information -
Follow the RCA Clean method below with a hydrofluoric acid (HFA) wash to remove oxide layer. The oxide layer will take a few hours in a normal atmosphere to regrow so deposition of metal should proceed immediately after the HFA wash.

Media:RCA_Clean.pdf
Media:Making_ohmic_contacts.pdf

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